Used ULVAC EI-5 #9107280 for sale

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Manufacturer
ULVAC
Model
EI-5
ID: 9107280
EB System, 2009 vintage.
ULVAC EI-5 is an advanced sputtering equipment used for thin-film deposition. It provides 5-chamber simultaneous sputtering (2-chamber vs 3-chamber) with unmatched flexibility and uniformity in sputtering, making it ideal for a variety of applications, including hard and soft magnetic materials, for high performance semiconductor and MEMS devices. The high-precision bias sputtering capability of EI-5 provides the highest process uniformity over a wide area, allowing for a superior product consistency across a wafer. The design features of the system are built for precise control and allow the user to select from a variety of sputtering processes, such as high rate DC sputtering, high flux Pulsed DC sputtering and very high rate hybrid DC/pulsed magnetron sputtering. The adjustable chamber sizes provide the unique capability to accommodate any substrate size, including large scale frames. ULVAC EI-5 unit also offers optimized sputter designs which improve the uniformity of the thin film deposition and target utilization rates. The optimal target design eliminates the need to use multiple small targets, simplifying and reducing the cost of sputter process reduction. Furthermore, the internal shielding design on the sputtering cathodes helps to eliminate magnetic line-of-sight risks and prevents cross-contamination between chambers. The closed loop process monitoring and control results in consistent results and helps optimize run time and quality. EI-5 is equipped with a variety of vacuum components and accessories to meet the most demanding requirements, such as sputter sources, power supplies, gas handling, process controllers and safety systems. Offering both easy usage and superior performance, ULVAC EI-5 is a must-have for users looking for a sputtering machine that can deliver a reliable, high-quality product. With its modular, scalable design, it can meet a wide range of requirements, from simple to demanding applications, and is the perfect choice for those seeking to reduce cost and maximize performance.
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