Used VON ARDENNE CS 850S #9167930 for sale

VON ARDENNE CS 850S is a sputtering equipment designed for medium to large area thin film deposition. This system is designed to coat substrates with a uniform, consistent layer of metal, dielectric or ceramic coatings and provides users with a variety of sputter processes that are tailored to their specific application. CS 850S is constructed of anodized aluminum and steel, with all components housed inside a pressurized, stainless-steel vacuum chamber. The chamber is 12" in diameter and 18.5" in length, and can be briefly evacuated to 150 mTorr. On the top of the chamber is the evaporation/sputtering cathode, which is 9" in diameter and 3.5" deep, and is designed to hold up to 6 circular substrates for simultaneous coating. On the lower part of the chamber is a Magnetron Sputtering Source which takes up 4.5" x 4.5" of space, and provides an energetic sputtering environment for ideal deposition rates and film quality. VON ARDENNE CS 850S features a primary controller with an integrated touch screen monitor for process monitoring and adjustment. It is equipped with an RF heating unit which enables temperatures of up to 500°C. Process parameters such as deposition rate, deposit thickness, uniformity, and roughness can be modified on the controller. Additionally, the machine is capable of controlling deposition rate up to 1μm/min and a continuous mode can be used for patterned deposition. The tool is also supplied with a Substrate Temperature Controller, a asset for handling up to 6 substrates, and several software programs for operation and management. CS 850S is designed to be user friendly and can be used by scientists and engineers from various disciplines to quickly and consistently deposit uniform, quality thin film coatings.