Used LAM RESEARCH 4500 #293600180 for sale

Manufacturer
LAM RESEARCH
Model
4500
ID: 293600180
Etcher.
LAM RESEARCH 4500 is an advanced etching/asper equipment designed to efficiently produce a variety of etched patterns on semiconductor substrates with precision and accuracy. This etching system is equipped with an advanced gas delivery unit and can support a variety of gases, including SF6, O2, C4F6, NF3, and C3F8. It also includes a load lock chamber and an in situ cleaning chamber as well as a plasma source, enabling the user to perform etching operations in a single operation cycle. The machine has a wide range of process capabilities, including in-situ cleaning, plasma activation, etching, and surface passivation. This is due to its large heating range of -70°C to +300°C, making it suitable for different materials, such as Si, SiO2, GaAs, and InP. Additionally, it offers fine control over etching parameters such as temperature, RIE (Reactive Ion Etching) power, chamber pressure and time, making it possible to produce precisely etched features with well-controlled aspect ratios. 4500 provides excellent wafer throughput, thanks to its high-throughput load lock chamber design, making it suitable for high-volume production environments. This tool offers exceptional safety and environmental protection, as it is equipped with a variety of safety mechanisms including an onboard pressure monitoring asset and an auto-purge model. It also includes an integrated wafer-inspection module and an isolated nozzle to reduce process-induced particles. In addition, LAM RESEARCH 4500 offers extensive process analytics and data control, enabling users to fine-tune the etching process and monitor the results in real time. An optional Wi-Fi connection makes it possible to remotely access and control the equipment, while an integrated touchscreen display allows users to interact directly with the etching process. This makes it possible to quickly and easily modify parameters and monitor results, improving end-to-end process efficiency. 4500 provides a reliable and cost-effective etching/asper solution for a variety of production environments. Its advanced design, process capabilities, and safety features make it an ideal choice for etching and passivation operations.
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