Used NOVELLUS CONCEPT 2 Speed #9238452 for sale
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ID: 9238452
CVD-HDP System, 8"
(2) Chambers
HDP / Shrink
Missing parts
2010 vintage.
NOVELLUS CONCEPT 2 Speed is an advanced dual processing plasma enhanced chemical vapor deposition (PECVD) reactor designed to provide improved piece part uniformity and increased manufacturing throughput. It is the one of the most advanced PECVD systems available on the market for the deposition of thin film coatings. CONCEPT 2 Speed PECVD reactor utilizes a dual-processing chamber with RF-supported, non-thermal plasma to create a uniform layer of coatings with exceptional homogeneity and properties. The 2 Speed system offers exceptional layer accuracy, uniformity, and surface quality by utilizing two alternating process chambers and two individual RF generators, which allows for improved film control, repeatability and accuracy compared to single chamber systems. This PECVD system features high accuracy process gas metering and control, which helps ensure proper working parameters and substrate uniformity for improved process control and homogeneity. It also offers a direct plasma generator, which helps to reduce process chamber contamination while providing superior repeatability. It offers users a wide range of optional process gas compositions and chamber pressures, allowing for the deposition of multiple layers for complex topologies. NOVELLUS CONCEPT 2 Speed also offers improved filtration for high-density coatings. This eliminates the need for additional cleaning and drying cycles, providing increased throughput with improved cost savings. It also features a thoroughly monitored substrate temperature control, which helps to reduce defect formation. CONCEPT 2 Speed PECVD system is designed for cleanroom and production applications in a variety of industries. It is suitable for coatings such as oxides, nitrides, carbides, and fluorides for applications including semiconductor processing, flat panel displays, automotive, opto-electronics, and decorative coatings.
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