Used EVG / EV GROUP 101 #293651855 for sale

EVG / EV GROUP 101 is a photoresist system designed for creating micro- and nano-scale structures in a variety of materials including glass, metal, semiconductors, and polymer materials. The system consists of five main components: a stepper, a multi-stage exposure unit, a development unit, an etching unit, and a post-exposure baking unit. Each component plays an essential role in the production of complex features on the substrate material, working together to provide high resolution images with repeatable results. The stepper serves as the heart of the system, scanning the substrate in a controlled, precise manner and providing the core of the photolithography process. By using a stepper, low-exposed images can be achieved with a high degree of reliability. Adjacent to the stepper is the multi-stage exposure unit. The unit is responsible for exposing the substrate to UV light in a predetermined pattern, with UV light being supplied at user-defined wavelengths and intensities. This process hardens the light-exposed parts creating a resist layer over the substrate. The development unit is then used to clean the substrate and further refine the process. This is done via a variety of chemicals specifically suited to the material being processed. The result of this step is the removal of the unexposed parts, creating the desired patterns via a subtractive approach. The final stage of the process is etching. In this stage, the material is etched away using a chemical etchant, creating features down to 100µm in size. This method can be used to create other features as well, such as holes and channels. Finally, a post-exposure baking unit is used to heat the substrate and refine the material. This step helps improve the chemical resistance of the resist layer, create a stronger bond between the resist and the substrate, and can be used for other processes such as reflow soldering. EVG 101 is a powerful and versatile tool for creating complex structures on a variety of materials, allowing for high resolution images with excellent repeatability. Its components work together to achieve precise micro- and nanoscale structures, enabling the creation of devices to precise specifications.