Used AIXTRON Crius I #293586746 for sale

AIXTRON Crius I is a high-throughput epitaxial reactor designed for deposition of thin films. The reactor is equipped with an inductively coupled plasma source which provides an oxygen-ion beam for substrate etching, and an electron cyclotron resonance (ECR) plasma source which produces high density plasmas for layer growth. The design of Crius I allows for a larger process window and improved uniformity of thin films. AIXTRON Crius I reactor provides users with high-performance thin film deposition for a wide range of substrates and materials. The flexible process window and high throughput of Crius I allows users to accommodate challenging substrates and materials, such as solar cells, LEDs and semiconductors. The advanced plasma source and superior material uniformity of AIXTRON Crius I provide exceptional thin film quality. Crius I has a loadlock equipment which allows user to quickly load and unload wafers. The wafers are exposed to their environment through ultra-high vacuum and nitrogen, making it possible to maintain a high-quality vacuum in the process chamber. Additionally, the 5 inch segmented coils allow for accurate positioning of the plasma and etching beams, providing uniform thin films. Furthermore, AIXTRON Crius I is equipped with a high resolution end-point detection system to ensure precise endpoints and improved layer uniformity. This advanced unit provides users with reliable and repeatable results. Additionally, Crius I has a built-in self-diagnostic machine that allows for quick troubleshooting and allows the user to easily check the status of the reactor. Overall, AIXTRON Crius I is a powerful and reliable thin film deposition tool. With its high-performance plasma source, superior thin film quality, and reliable end-point detection asset, Crius I provides users with a flexible process window and exceptional uniformity.