Used ULVAC SMI-60H #293647824 for sale

Name: ULVAC SMI-60H
Brand: ULVAC
SKU: 293647824
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Ion Implanters & Monitors

Manufacturer

ULVAC

Model

SMI-60H

ID: 293647824

Wafer Size: 12"

Vintage: 2007

Medium current hydrogen ion implanter, 12" DI Water circulator (2) Mass flow controllers (20) Transfer particles: ±0.2 µm Ion source head: H2+, 4He+ X-Ray leak rate: 0.6 µSv/h Gas supply line:H2 / He Gas bottle Vacuum pumping system: EBARA AA10N Dry pump SHIMADZU TMP803M Turbo molecular pump, 800 liter/sec SHIMADZU TMP1003M Turbo molecular pump, 1000 liter/sec Process chamber: SHIMADZU TMP3203M Turbo molecular pump, 3000 liter/sec EBARA AA10N Dry pump Turbo molecular pump 300 liter/sec Pirani vacuum gauge Ionization vacuum gauge End station (Transfer chamber / Process chamber) Substrate size: 230mm x 180 mm x 0.7 mm Vacuum transfer system: Vacuum transfer robot Platen: ESC Substrate scanning system: Y-Stage ATM transfer robot Clean unit (2) Rorze RV201-F05-004-1 Foup Opener Notch aligner: for 300 mm and 200 mm Conversion kit for 200mm / 300mm: Platen, cooling plate, L/L plate Vacuum robot pick-up Maximum beam current: 8mA at 60 keV at H2+ 8mA at 35 keV at He+ Beam current stability: ≤±10 % / hour Implant uniformity: ≤5％ (Distribution of peak depth) Implant condition: H2+ , 60kV, 3.0E16 ions/cm Measurement condition: SIMS 5piont (Within wafer) Mass analyzing capability: H2+, 4He Substrate size: 230 mm x 180 mm Dose integrator capability: 1.0E15 –2.0E17 ions/cm² Wafer tilt angle: 0 to 60° (±1°) Metal contamination: Surface <5x1010/cm² (Fe, Ni, Cr, Zn, Cu by TXRF) Implant condition: H2+ ,60keV, 3.0E16 ions/cm² Ultimate pressure : Ion Source: 6.7x10-4 Pa(5.0x10-6Torr) Beam Line: 6.7 x 10-5 Pa(5.0x10-7Torr) Process chamber: 6.7 x 10-5 Pa(5.0x10-7Torr) Ion extraction system: Extraction power supply Extraction electrode Beam focusing system: Einzel-lens Power supply Mass analyzer magnet: Deflection Coil Magnet, 90° Power supply for magnet: 10V / 60A Analyzing slit Post acceleration system: Acceleration tube High voltage power supply Beam focusing system: Magnetic quadrupole lens Power supply Beam monitoring system: Pre-amplifier Dose monitor Control system: Computer End-station / Pumping control: Sequencer UPS For computer Energy range: 30keV to 70keV (for H2+) 30keV to 35keV (for He+) Spare parts: Ion source consumable parts Power: 35~60keV Dose: 1.0 x 10^15 ~ 2.0 x 10^17 H2+ions/cm² Max RP: ~600 nm Manuals included 2007 vintage.

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ULVAC SMI-60H is a leading ion implanter and monitor that is used in the semiconductor industry. It is a high-performance tool that provides the highest implantation accuracy in the market. It is designed to provide efficient, high-precision ion implantation processes, with superior reproducibility and minimal maintenance required. SMI-60H utilizes advanced control and acceleration technologies to provide an optimal ion implanting process. It is equipped with a state-of-the-art beam forming system that allows for maximum flexibility when selecting the beam profile, electric and magnetic fields. This system enables incredibly accurate implantation results, with negligible beam fragmentation. Additionally, various types of ions can be used for various types of substrates and implants. The user interface of ULVAC SMI-60H is highly intuitive and easy to use. Players can quickly setup processes and parameters for different implantations with ease. It also comes equipped with comprehensive materials analytics functions to ensure optimal implantation results. Furthermore, the comprehensive monitoring functions ensure users have all the information they need to optimize the process and improve process output. SMI-60H also comes with a smart temperature control system, ensuring that the substrate is heated to an optimal processing temperature. This reduces the potential risk of thermal damage to the substrate. Additionally, it maintains the implanted particles in a stable and secure environment, thus ensuring their accuracy. ULVAC SMI-60H is designed for maximum safety and reliability, with numerous safety systems and sensors in place. This allows users to operate the device without worry, while performing ion implantation with minimum chances of device failure. Furthermore, the unit is designed to be highly efficient, and with its flexible setup, it is able to reduce process cycle time, thus ensuring maximum productivity. SMI-60H is an incredibly powerful and reliable ion implanter and monitor. It utilizes advanced technologies and features that enable precise and accurate implantation processes, with minimal maintenance required. Thanks to its intuitive user interface, users can quickly and easily setup various implantations and monitor the results. The comprehensive safety systems ensure maximum safety for the users and the substrates. All of these features and technologies make ULVAC SMI-60H an ideal choice for any semiconductor industry.