Used AMAT / APPLIED MATERIALS WxZ Chamber CVD Centura for P5000 #293648481 for sale

AMAT / APPLIED MATERIALS WxZ Chamber CVD Centura for P5000 is a unique chemical vapor deposition (CVD) reactor designed for use in integrated circuits (IC) fabrication. This state-of-the-art equipment boasts of a multiple stations (up to two) chemical reaction heating equipment that produces exceptionally uniform film deposition, allowing for precise layer thickness control and increased throughput. The reaction chamber is equipped with WxZ chambers that have a high electrostatic-coupled film deposition rate and superior directional uniformity. It also offers improved heat conduction across the chamber, eliminating hot spots and allowing uniform thermal gradient deposition. This equipment offers impressive substrate loading capabilities with either one or two transfer mechanisms. Each mechanism offers up to five custom loading positions which can be optimized for optimal precursor uniformity. The loading capacity is further improved by Electrostatic-Coupled CVD, enabling a wide range of film growth techniques such as conformal CVD, diffusion control and surface control systems. The system also allows the creation of multiple film layers. The P5000 offers a high resolution vision unit which increases accuracy when aligning substrates. The dual substrate cleaning arm offers an additional layer of cleaning which increases reliability and precision during production. A built-in area monitor analyzes the composition and homogeneity of the deposition. The direct data acquisition feature of the controller allows for easy recording and tracking of data. In addition, the P5000 takes advantage of an advanced temperature control machine that provides unparalleled thermal uniformity. The software is equipped with up to four Gas Flow profiles that can be tailored to the desired application. The use of Leak-Proof Chamber CVD further improves process dependability. Utilizing low pressure dynamic processes further eliminates the need for vacuum pumps, saving time and money on downstream process vacuum costs. Overall, AMAT WxZ Chamber CVD Centura for P5000 provides users with a versatile and reliable equipment for IC fabrication. Its state-of-the-art design, multiple substrate cleaning stages and temperature control tool, combined with its advanced software, make this reactor an industry leader in CVD technology.