Wafer Steppers

NIKON NSR 2205 i11D Stepper.

NIKON NSR 2205 i12D i-Line stepper.

ASML PAS 5000 / 55 Stepper / scanner, 0.50um i-line, 3"-6" Fully automated wafer handling system 2" with holders capable.

ASML PAS 5000 / 55 i-Line Stepper Software version: 3.1.0 Reticle size: 5" Lens Data: Wave length: 365nm (i-line) NA: 0.48 Resolution: 0.50µm Field Size Diameter: 21.2mm Max X: 15mm Max Y: 19mm Usable Depth of focus: ≥1.2µm at specified resolution of 0.50µm with 10% CD Control and > 83° wall angle Distortion: 100nm Currently stored in a cleanroom.

ASML PAS 5500 / 100D Stepper, 8" (1) HDD Hard disk software: 6.2.2.C (Backup) 8.9.0C (Current disk) Intensity data: 245 mW/cm2 Uniformity: 2.71% (2014.2.27) Dose accuracy: 0.37 % Repeatability: 0.37 %(2014.2.27) Single machine overlay: X: 21 nm Y: 23 nm (2005.12.23) Wafer stage accuracy: X : 5 nm Y 10 nm (2005.12.23) Wafer stage repeatability: X: 4 nm Y: 8 nm (2005.12.23) Currently de-installed 1996 vintage.

ASML PAS 5500 / 100D Stepper, 8" HDD Intensity data: 245 mW/cm2 Uniformity: 2.71% (2014.2.27) Dose accuracy: 0.37 % Repeatability: 0.37 % (2014.2.27) Single machine overlay: X: 21 nm Y: 23 nm (2005.12.23) Wafer stage accuracy: X: 5 nm Y: 10 nm (2005.12.23) Wafer stage repeatability: X: 4 nm Y: 8 nm (2005.12.23) 1996 vintage.

ASML PAS 5500 / 1100 ArF Scanner, 8" 193nm Lithography Signal tower: Local SPM Alignmet: Standard Optical prealign mark sensor: Standard Wafer type: Notch FAT Attendance: Yes Laser type: Cymer laser Extended exposure: Yes IRIS-6 Inch reticles: Yes Cassette elevator position: 1 / 2 Wafer track interface: TEL Mark 5 / 7 / 8' ACT8 SECS I / II Interface: Yes Batch streaming: Advanced RMS Tape streamer OCU-MK4 or less: Yes Single reticle SMIF handling: Yes Sign All: Yes Reticle SMIF pod tag reader: Stepper version Metrology data interface: Yes Reticle barcode reader 24 char: Yes Extended exposure translation: Yes ASF E-chuck flatness qualifc: Yes ASF Applic specific lensheat: Yes CSRs vanous: CSR4066 / CSR 4442 Extended exposure: Yes 25m Hose / Cable set: Yes Multiple exposure: Yes Quasar: Yes (DOE ID13 MP4 30 included) ASF Small marks: Yes IOSc-3 package: Yes PEP1100: Yes Dosemapper: Yes ASF: Improved TIS measurement: Yes Hertz: 60 Hertz Power: 208 Volt Key tool performance indicators: Focal plane deviation [nm]: 98 Astigmatism [nm]: 68 Lens distortion measured 139 points / field: Non-correctable error [nm] NCE X: 2.7 NCE Y: 1.7 Dynamic performance: Moving standard deviation mean +3 Sigma: 7.5 Moving average mean +3 Sigma: 1.9 Focus repeatability (3σ) [μm]: 0.021 Levelling repeatability: Rx (3σ) [μrad]:1.02 Ry (3σ) [μrad]:1.11 Overlay performance: Stage repeatability: X [nm]: 1.6 Y [nm]: 3.1 Single machine overlay: 99.7% X - Max 99.7%: 7.7 Y - Max 99.7%: 7.3 Matched machine overlay (99.7%): 10.6 Material handling: X Position (3σ) [μm]: 0.39 Y Position (3σ) [μm]: 1.92 Rotation θ (3σ) [μrad]: 18.21 Image quality control: 3σ Image sensor measurements: Focus repeatability: 4.78 Image tilt repeatability (Rx): 0.23 Image tilt repeatability (Ry): 0.31 Translation repeatability: 0.69 Magnification repeatability: 0.03 Die rotation repeatability: 0.06 Reticle inspection systems IRIS option: Size and position reproduciblity: Position range / Size standard deviation: 0.997 Inspection time [s]: 140 Stray light: Cleaning trigger: 3.22% Tamis: Z7: 0.592 Z8: 1.271 Z9: 0.29 Additional elements tool include: Laser 4kHz: Upgraded source / CYMER 7600A laser IRIS: Reticle inspection system Dose mapper IOSc 3+: Overlay improvement Quasar: Automated DOE exchanger Metrology data interface Currently warehoused.

ASML PAS 5500 / 750 DUV Scanner, 8" 248 nm Missing parts or components: Computer system: SUN STATION ASSEMBLED ULTRA 10 / CRT Monitor / Mouse trackball SCR Rack: Current amplifier CPU board TCS3x mater / TC3X Current amplifier all (6) boards / +5V PSU /+24V PSU AAR Rack: Power supply boards / CPU / Optical & analog demodulators boards WPR Rack: PSDC 48V MSR Rack: Power supplies 5 V and 7V/LS and AL hinds controllers RMR Rack: Velocity drive digital / Sensor board / Z Sensor analog & digital boards IL Rack: Illumination interface board / PID 2,4,5 Boards / Power amplifier board / Level master board / PTI board ARMS Rack: Library card1 / Remote reset / CPU Wafer handling module: Gripper unit / Prealignment unit / Discharge unit / Input pedestal / Dipod unit / Switch clamp valve Reticle handling module: (3) Libraries / Upper & lower robot Illumination module: Doe exchanger / ACL Board / BMU / Beam stearing / LSI Board AIR mount module: +(3) Servo valve Tc3x block / More geophone and pre amp boards on AM WS Module: (2) Air bearings / Short-long stroke decoupling block / Air bearing controllers / All HP Receivers / Flax cable fibre optics Alignment module: TTL Laser / OA Red & green laser / Power supply red & green laser / OA CCD CAM Temperature conditioning module: C&T Unit and controller / Exhaust fan / ACC Fan & controller CYMER Laser 61433 Laser 1A8B Tool model: ELS-6600 LNM / WCM / MCS Board / TCS Board / Exhaust vacuum sensor 2000 vintage.

ASML PAS 5500 / 80 i-Line stepper 2003 vintage.

ASML PAS 5500 / 200 Stepper.

ASML PAS 5500 / 200 Stepper.

ASML AT-850 ARF Scanner Currently warehoused 2004 vintage.

ASML PAS 5500 / 200 Stepper.

ASML PAS 5000 / 50 Stepper.

ASML PAS 5500 / 250C Stepper.

ASML PAS 2500 / 40 Stepper Missing parts: Temperature control unit (TCU) 1989 vintage.

ASML PAS 5000 / 55 Stepper.

ASML 5000 / 50 Steppers, 6" Floppy drive: 5.25", can be converted to 3.5" floppy TEP Kay pneumatic (1 unit does not have this) Mark 3 E chuck Mark 3 P chuck No memory upgrade.

ASML PAS 5500 / 100D Stepper, 8" HDD Intensity data: 245 mW/cm2 Uniformity: 2.71% (2014.2.27) Dose accuracy: 0.37 % Repeatability: 0.37 % (2014.2.27) Single machine overlay: X: 21 nm Y: 23 nm (2005.12.23) Wafer stage accuracy: X: 5 nm Y: 10 nm (2005.12.23) Wafer stage repeatability: X: 4 nm Y: 8 nm (2005.12.23) 1996 vintage.

ASML PAS 5500 / 1100 ArF Scanner, 8" 193nm Lithography Signal tower: Local SPM Alignmet: Standard Optical prealign mark sensor: Standard Wafer type: Notch FAT Attendance: Yes Laser type: Cymer laser Extended exposure: Yes IRIS-6 Inch reticles: Yes Cassette elevator position: 1 / 2 Wafer track interface: TEL Mark 5 / 7 / 8' ACT8 SECS I / II Interface: Yes Batch streaming: Advanced RMS Tape streamer OCU-MK4 or less: Yes Single reticle SMIF handling: Yes Sign All: Yes Reticle SMIF pod tag reader: Stepper version Metrology data interface: Yes Reticle barcode reader 24 char: Yes Extended exposure translation: Yes ASF E-chuck flatness qualifc: Yes ASF Applic specific lensheat: Yes CSRs vanous: CSR4066 / CSR 4442 Extended exposure: Yes 25m Hose / Cable set: Yes Multiple exposure: Yes Quasar: Yes (DOE ID13 MP4 30 included) ASF Small marks: Yes IOSc-3 package: Yes PEP1100: Yes Dosemapper: Yes ASF: Improved TIS measurement: Yes Hertz: 60 Hertz Power: 208 Volt Key tool performance indicators: Focal plane deviation [nm]: 98 Astigmatism [nm]: 68 Lens distortion measured 139 points / field: Non-correctable error [nm] NCE X: 2.7 NCE Y: 1.7 Dynamic performance: Moving standard deviation mean +3 Sigma: 7.5 Moving average mean +3 Sigma: 1.9 Focus repeatability (3σ) [μm]: 0.021 Levelling repeatability: Rx (3σ) [μrad]:1.02 Ry (3σ) [μrad]:1.11 Overlay performance: Stage repeatability: X [nm]: 1.6 Y [nm]: 3.1 Single machine overlay: 99.7% X - Max 99.7%: 7.7 Y - Max 99.7%: 7.3 Matched machine overlay (99.7%): 10.6 Material handling: X Position (3σ) [μm]: 0.39 Y Position (3σ) [μm]: 1.92 Rotation θ (3σ) [μrad]: 18.21 Image quality control: 3σ Image sensor measurements: Focus repeatability: 4.78 Image tilt repeatability (Rx): 0.23 Image tilt repeatability (Ry): 0.31 Translation repeatability: 0.69 Magnification repeatability: 0.03 Die rotation repeatability: 0.06 Reticle inspection systems IRIS option: Size and position reproduciblity: Position range / Size standard deviation: 0.997 Inspection time [s]: 140 Stray light: Cleaning trigger: 3.22% Tamis: Z7: 0.592 Z8: 1.271 Z9: 0.29 Additional elements tool include: Laser 4kHz: Upgraded source / CYMER 7600A laser IRIS: Reticle inspection system Dose mapper IOSc 3+: Overlay improvement Quasar: Automated DOE exchanger Metrology data interface Currently warehoused.