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2116 RESULTS FOUND FOR: used Wafer Steppers

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    NIKON NSR 2205 i11D Stepper.
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    NIKON NSR 2005 i8A Stepper 1993 vintage.
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    NIKON NSR 2005 i8A Stepper 1993 vintage.
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    NIKON NSR 2005 i8A Stepper 1993 vintage.
  • -: -

    NIKON NSR 2005 i8A Stepper 1993 vintage.
  • -: -

    NIKON NSR 2005 i8A Stepper 1993 vintage.
  • -: -

    NIKON NSR 2005 i8A Stepper 1993 vintage.
  • -: -

    NIKON NSR 2005 i8A Stepper 1993 vintage.
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    NIKON NSR 2205 i12D i-Line stepper.
  • AMAT / APPLIED MATERIALS: WIDE BODY

    APPLIED MATERIALS Wide body Load Lock, 6"-8", as-is.
  • APT: 280AN

    APT 280AN Gallium Arsenide Wafer Titler, 3"-5" Exposes up to 16 easy to read alphanumeric characters across the wafer flat or at 3 other selectable locations in 90 degree increments from the flat.
  • ASML: 5000 / 55

    ASML 5000 / 55 Stepper, 6", can be inspected, currently located in a fab and powered off.
  • ASML: PAS 5500 / 80

    ASML PAS 5500 / 80 Stepper, 8" Missing parts : Wafer Handling, Delta Electronica, AIRCO module Defective parts : various auxiliary cabinet electrical parts ================================================================================ ## PM MONTHLY avec/sans CHGT LAMPE ================================================================================ AUTHOR : XXXXXX VERSION : 11/05/2004 STEPPER : I-line ##============================================================================== ## Preventive Maintenance CHECKLIST ##============================================================================== ## ## Badge status Ws Retry ## ## Back-up Machines Constants on hd ls45 done ## Changement de lampe SI dans le planning na ## Nettoyage WH ls45 done ## Nettoyage RH ls45 done ## Controle Tower Lamp ls45 done ## Controle Ozoniser Lamp ls45 done ## Verification Tcu fait par tob ## Verification Mark Sensor ls45 done y - ## Verification Edge Sensor ls45 done y - ## Verification Illumination ls45 done y - ## Verification Dose repro (si lampe changee) na ## Verification Chuckspot ls45 done y - ## Verification Height & Tilt ls45 done y - ## Verification Tilt to tilt ls45 done y - ## Verification FEM ls45 done y - ## Verification Field Matching ls45 done y 2 ## Verification CD Matching fait par tpm svg ## Execution Back up des MCs sur hd ls45 done ## Execution Reboot ls45 done ================================================================================ ## Commentaires ##============================================================================== ## ## ## ## Tous les commentaires doivent etre rentres dans WS. Pour cela, utiliser la commande ENHA et attacher le commentaire a l'event de debut, milieu ou fin de PM. ================================================================================ Preventive Maintenance REPORTS ================================================================================ -------------------------------------------------------------------------------- Back-up Machines Constants on Tape -------------------------------------------------------------------------------- 12/15/2008 22:06:32 Machine:4419 (Rel:8.9.0.c, MCST [20125], MCMA_step.c, 1516) OK All Machine Constants are backed up to file: MC/4419_ALL_machine.const.2008_12_15.22h06m32.tgz -------------------------------------------------------------------------------- Cleaning Wafer Handling -------------------------------------------------------------------------------- done -------------------------------------------------------------------------------- Cleaning Reticle Handling -------------------------------------------------------------------------------- done -------------------------------------------------------------------------------- Controle Tower Lamp -------------------------------------------------------------------------------- done -------------------------------------------------------------------------------- Controle Ozoniser lamp -------------------------------------------------------------------------------- done -------------------------------------------------------------------------------- Tcu ------------------------------------------------------------------------------- fait par tob -------------------------------------------------------------------------------- Mark Sensor -------------------------------------------------------------------------------- Operator:ASM Machine:4419 Release:8.9.0 Date:12/15/2008 Time:22:35 Wafer handling reproducibility test TEST : Mark Repro Initial use of Indexers Indexer 1 : Not used Indexer 2 : Not used Indexer 3 : Input Indexer 4 : Output Wafertrack input : N Wafertrack output : N Integrity Option : None Number of batches : 1 Wafers per batch : 20 Prealignment data Prealignment mode used : 0 Wafer standard : SEMI Notch Prealignment mode : Fallback Nominal WCS Theta [rad] : 0.00000 Mark 1 [mm] X : 80.0000 Y : 0.0000 Mark 2 [mm] X : 80.0000 Y : 0.0000 Alignment data Do zero aligns : N Focus offset [um] : 0.0000 Alignment Mark 1 [mm] X : 80.0000 Y : 0.0000 Alignment Mark 2 [mm] X : -80.0000 Y : 0.0000 Reticle id : * Test result : OK +------------------------------------------------------------------------+ | Errors during test | +------------------------------------------------------------------------+ +========================================================================+ | No errors | +------------------------------------------------------------------------+ Results for all wafers and batches +-------+-------+-----------------------+------------------------------------+ | | | Prealign offset | Alignment wafer-to-stage offset | | | +-----------+-----------+-----------+-----------+------------+ | Batch | Wafer | X [um] | Y [um] | X [um] | Y [um] | Rot [urad] | +=======+=======+===========+===========+===========+===========+============+ | 1 | 1 | 11.02 | 44.77 | -2.26 | -0.56 | -6.06 | | 1 | 2 | 20.48 | -47.28 | -1.34 | -0.38 | -1.11 | | 1 | 3 | 16.17 | -49.18 | -1.62 | -1.40 | -0.17 | | 1 | 4 | 29.03 | -59.71 | -1.24 | -1.00 | -11.67 | | 1 | 5 | 7.63 | 24.76 | -1.48 | -0.96 | -3.92 | | 1 | 6 | -0.33 | 48.42 | -1.41 | -1.90 | -10.55 | | 1 | 7 | 169.36 | 90.31 | -1.08 | -1.54 | -16.59 | | 1 | 8 | 2.83 | 34.78 | -1.31 | -0.56 | 11.19 | | 1 | 9 | 2.73 | 46.19 | -1.29 | -1.47 | 0.39 | | 1 | 10 | 7.75 | 19.02 | -1.28 | -2.86 | -34.52 | | 1 | 11 | 3.42 | 28.45 | -1.98 | -1.08 | -3.43 | | 1 | 12 | 6.89 | 33.89 | -1.09 | -1.45 | -16.25 | | 1 | 13 | 7.69 | 39.76 | -1.42 | -2.10 | -24.26 | | 1 | 14 | 4.93 | 40.01 | -1.60 | -2.27 | -3.51 | | 1 | 15 | 8.39 | 33.21 | -0.95 | -1.42 | -5.83 | | 1 | 16 | 3.94 | 42.95 | -1.11 | -2.14 | -8.81 | | 1 | 17 | 6.62 | 40.78 | -1.32 | -0.85 | -13.55 | | 1 | 18 | 7.76 | 43.12 | -1.22 | -1.77 | -23.99 | | 1 | 19 | 13.35 | 39.36 | -1.24 | -2.21 | -24.99 | | 1 | 20 | 11.30 | 42.55 | -1.18 | -1.90 | -4.52 | +-------+-------+-----------+-----------+-----------+-----------+------------+ Computed results for all the processed wafers +---------------+-----------+-----------+-----------+-----------+-----------+ | | X offs | Y offs | X align | Y align | Rotation | | | [um] | [um] | [um] | [um] | [urad] | +===============+===========+===========+===========+===========+===========+ | Minimum | -0.33 | -59.71 | -2.26 | -2.86 | -34.52 | | Maximum | 169.36 | 90.31 | -0.95 | -0.38 | 11.19 | | Mean | 17.05 | 26.81 | -1.37 | -1.49 | -10.11 | | Std. Dev. | 36.48 | 36.73 | 0.31 | 0.66 | 10.86 | +---------------+-----------+-----------+-----------+-----------+-----------+ --------------------------------------------------------------------------------Edge Sensor -------------------------------------------------------------------------------- Operator:ASM Machine:4419 Release:8.9.0 Date:12/15/2008 Time:22:50 Wafer handling reproducibility test TEST : Edge Sensor Repro Initial use of Indexers Indexer 1 : Not used Indexer 2 : Not used Indexer 3 : Output Indexer 4 : Input Wafertrack input : N Wafertrack output : N Integrity Option : None Number of batches : 1 Wafers per batch : 20 Prealignment data Prealignment mode used : 0 Wafer standard : SEMI Notch Prealignment mode : Edge Sensor Nominal WCS Theta [rad] : 0.00000 Alignment data Do zero aligns : N Focus offset [um] : 0.0000 Alignment Mark 1 [mm] X : 80.0000 Y : 0.0000 Alignment Mark 2 [mm] X : -80.0000 Y : 0.0000 Reticle id : * Test result : OK +------------------------------------------------------------------------+ | Errors during test | +------------------------------------------------------------------------+ +========================================================================+ | No errors | +------------------------------------------------------------------------+ Results for all wafers and batches +-------+-------+-----------------------+------------------------------------+ | | | Prealign offset | Alignment wafer-to-stage offset | | | +-----------+-----------+-----------+-----------+------------+ | Batch | Wafer | X [um] | Y [um] | X [um] | Y [um] | Rot [urad] | +=======+=======+===========+===========+===========+===========+============+ | 1 | 1 | -44.28 | 49.17 | 5.94 | -4.63 | 52.19 | | 1 | 2 | -23.34 | -40.52 | 5.69 | -1.03 | 1.66 | | 1 | 3 | -36.41 | -35.89 | 6.27 | -4.98 | -18.16 | | 1 | 4 | -45.81 | 62.93 | 5.37 | -2.38 | -29.39 | | 1 | 5 | -38.24 | 25.09 | 5.60 | -2.13 | -7.58 | | 1 | 6 | -47.45 | 31.97 | 6.29 | -4.21 | -18.44 | | 1 | 7 | -44.30 | 55.95 | 5.33 | -4.23 | 2.75 | | 1 | 8 | -44.11 | 59.42 | 7.64 | -3.41 | 43.96 | | 1 | 9 | -45.58 | 69.58 | 6.15 | -1.82 | 12.57 | | 1 | 10 | -47.98 | 75.50 | 5.49 | -2.76 | 84.34 | | 1 | 11 | -48.44 | 66.77 | 7.31 | -4.59 | -57.11 | | 1 | 12 | -47.24 | 75.40 | 5.78 | -2.12 | 26.15 | | 1 | 13 | -49.07 | 83.95 | 6.36 | -2.61 | 22.29 | | 1 | 14 | -52.23 | 74.07 | 6.19 | -4.84 | 80.63 | | 1 | 15 | -43.81 | 64.26 | 5.81 | -3.34 | -21.00 | | 1 | 16 | -50.21 | 79.99 | 6.41 | -2.75 | 41.54 | | 1 | 17 | -47.76 | 55.65 | 6.70 | -4.50 | 44.64 | | 1 | 18 | -47.06 | 64.97 | 5.74 | -3.70 | 56.08 | | 1 | 19 | -52.90 | 86.77 | 5.28 | -2.49 | 47.98 | | 1 | 20 | -46.99 | 58.99 | 5.14 | -4.94 | 11.50 | +-------+-------+-----------+-----------+-----------+-----------+------------+ Computed results for all the processed wafers +---------------+-----------+-----------+-----------+-----------+-----------+ | | X offs | Y offs | X align | Y align | Rotation | | | [um] | [um] | [um] | [um] | [urad] | +===============+===========+===========+===========+===========+===========+ | Minimum | -52.90 | -40.52 | 5.14 | -4.98 | -57.11 | | Maximum | -23.34 | 86.77 | 7.64 | -1.03 | 84.34 | | Mean | -45.16 | 53.20 | 6.02 | -3.37 | 18.83 | | Std. Dev. | 6.48 | 34.86 | 0.65 | 1.20 | 37.78 | +---------------+-----------+-----------+-----------+-----------+-----------+ ------------------------------------------------------------------------------- Uniformity -------------------------------------------------------------------------------- Operator:ASM Machine:4419 Release:8.9.0 Date:12/15/2008 Time:22:17 Uniformity Measurement Comment : Image Field Size [mm] x : 21.0 y : 21.0 Diameter : 29.7 Steps x : 11 y : 11 Measurement Type : Sample Mode Lamp Power [W] : 1000.0 Samples per Position : 50 Apply REMA Window : Yes Load Reticle : N Uniformity Measurement Result Uniformity [%] : 1.81 Logfile : LI/LIUM/waf.1214 Number of valid measurements : 121 Tilt X [%/field] : 0.28 Y [%/field] : -1.12 Overall Average of Ratio : 1.00 Standard Deviation : 0.01 Intensities Spot Sensor [mW/cm2] : 492.31 Standard Deviation : 4.56 Intensities Energy Sensor [mW/cm2] : 493.12 Standard Deviation : 0.26 Lamp Time Lit [hour] : 790:24 Estimated Uniformity from measured data [%] If corrected for actual tilts : 1.67 If corrected with gradient filter : 1.59 If corrected for tilts and with gradientfilter : 1.37 Symmetric Uniformity Value [%] : -0.88 -------------------------------------------------------------------------------- Chuckspot -------------------------------------------------------------------------------- Si chuckspot prÈsent, indiquer le(s) champs: 1 2 3 4 5 6 7 8 9 10 11 12 13 14 15 16 17 18 19 20 21 22 23 24 25 26 27 28 29 30 31 32 33 34 35 36 37 38 39 40 41 42 43 44 45 46 47 48 49 50 51 52 53 54 55 56 57 58 59 60 61 62 63 64 65 66 67 68 69 70 71 72 73 74 75 76 77 78 79 80 81 82 83 84 85 86 87 88 n -------------------------------------------------------------------------------- Height & Tilt -------------------------------------------------------------------------------- IS-White Level Sensor Tilt Offset - Metrology Calibration Operator:ASM Machine:4419 Release:8.9.0 Date:12/15/2008 Time:23:07 Define IS-White Level Sensor Tilt Offset Measure Results Tilt Rx [urad] Mean : -39.1 St. dev. : 0.3 Tilt Ry [urad] Mean : 98.9 St. dev. : 0.3 IS-White Level Sensor Tilt Offset Tilt Rx [urad] Current : -37.8 New : -39.1 Tilt Ry [urad] Current : 99.6 New : 98.9 Exposure Report Operator:ASM Machine:4419 Release:8.9.0 Date:12/15/2008 Time:23:13 Focus/Exposure Matrix Test Purpose : White Level Sensor Tilt Calibration Input Parameters Configuration : White Level Sensor Focus Mode : Closed Loop Mode Matrix Size X : 5 Y : 11 Step Increment [um] X : 300.0 Y : 300.0 Focus [um] Nominal : 0.00 Step : 0.20 Energy [mJ/cm2] Nominal : 174.0 Step : 5.0 Reticle ID : RESOL05B959 Reticle Pitches [mm] 1 : 52.050 2 : 52.050 3 : 66.050 Masking Window Size [mm] X : 110.00 Y : 138.00 Dies Exposed : C FEM Flatness Criterion : 0.30 Die Tilt Correction : N Expose SEM Reference Marks : N Lens Number : Energy To Clear Array : N Matrix Centres +----------+----------+ | X | Y | | [mm] | [mm] | +==========+==========+ | 0.000 | 0.000 | +----------+----------+ Wafer ID: 1 Temperature of Lens [degC] : 21.99 Pressure in Lens [mbar] : 990.96 flat edge/nodge Offset [um] : ____.___ Offset [um] : ____.___ Tilt X [urad] : ____.___ Tilt X [urad] : ____.___ Tilt Y [urad] : ____.___ Tilt Y [urad] : ____.___ Max Diff [um] : ____.___ Max Diff [um] : ____.___ 4 X ____.__ 8 X ____.__ 3 X ____.__ 4 X ____.__ 8 X ____.__ 3 X ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ 5 X ____.__ 0 X ____.__ 7 X ____.__ 5 X ____.__ 0 X ____.__ 7 X ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ 1 X ____.__ 6 X ____.__ 2 X ____.__ 1 X ____.__ 6 X ____.__ 2 X ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ C Offset [um] : 0.168 Tilt X [urad] : 5.388 Tilt Y [urad] : -3.522 Max Diff [um] : 0.249 2 X 10.41 6 X 0.00 1 X -10.41 Y -10.41 Y -13.21 Y -10.41 Z -17.09 Z -17.49 Z -18.14 dZ 0.25 dZ 0.26 dZ 0.30 7 X 10.41 0 X 0.00 5 X -10.41 Y 0.00 Y 0.00 Y 0.00 Z -17.78 Z -18.44 Z -18.84 dZ 0.12 dZ 0.00 dZ 0.14 3 X 10.41 8 X 0.00 4 X -10.41 Y 10.41 Y 13.21 Y 10.41 Z -18.36 Z -19.00 Z -19.31 dZ 0.08 dZ 0.13 dZ 0.23 Offset [um] : ____.___ Offset [um] : ____.___ Tilt X [urad] : ____.___ Tilt X [urad] : ____.___ Tilt Y [urad] : ____.___ Tilt Y [urad] : ____.___ Max Diff [um] : ____.___ Max Diff [um] : ____.___ 4 X ____.__ 8 X ____.__ 3 X ____.__ 4 X ____.__ 8 X ____.__ 3 X ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ 5 X ____.__ 0 X ____.__ 7 X ____.__ 5 X ____.__ 0 X ____.__ 7 X ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ 1 X ____.__ 6 X ____.__ 2 X ____.__ 1 X ____.__ 6 X ____.__ 2 X ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Y ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ Z ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ dZ ____.__ Points du Height&Tilt : 0 :-0.3 1 :-0.08 2 :-0.36 3 :-0.46 4 :-0.18 5 :-0.2 7 :-0.3 FPD :0.38 FC :0.03 -------------------------------------------------------------------------------- tilt to tilt -------------------------------------------------------------------------------- Model - Metrology Calibration/Match Stone to Lens Tilt; Level Sensor Tilt Operator:ASM Machine:4419 Release:8.9.0 Date:12/15/2008 Time:23:32 Tilt To Tilt matching -Modelling Measurement info Testlog : 4419 Date : Mon Dec 15 23:28:00 2008 Machine ID : 4419 Number of Wafers : 1 MCC Threshold : 0.00 Comment : Number of Wafers Rejected : 0 Reproducability tilt calibration stdev STOLE Rx [urad] : 0.0 stdev STOLE Ry [urad] : 0.0 stdev LS Rx [urad] : 0.0 stdev LS Ry [urad] : 0.0 Stone to Lens Tilt Old STOLE Rx [urad] : -52.7 STOLE Ry [urad] : -52.4 New STOLE Rx [urad] : -53.1 STOLE Ry [urad] : -50.1 Delta STOLE Rx [urad] : -0.4 STOLE Ry [urad] : 2.3 Level Sensor Tilt Old LS Rx [urad] : -75.8 LS Ry [urad] : -50.9 New LS Rx [urad] : -75.8 LS Ry [urad] : -50.9 Delta LS Rx [urad] : 0.0 LS Ry [urad] : 0.0 Model results per wafer +-----+--------+--------+--------+--------+---------+ |Wafer|STOLE Rx|STOLE Ry| LS Rx | LS Ry | MCC | | | [urad] | [urad] | [urad] | [urad] | | +=====+========+========+========+========+=========+ | 1 | -53.1 | -50.1 | -75.8 | -50.9 | 0.91 | +-----+--------+--------+--------+--------+---------+ -------------------------------------------------------------------------------- FEM -------------------------------------------------------------------------------- (penser a copier le report en allant dans: view test report/ Projection System /FEM developper custumer) focus=-0.2 -------------------------------------------------------------------------------- Field Matching -------------------------------------------------------------------------------- Data Modelling - Metrology Calibration/Machine Matching/Field Matching Operator:ASM Machine:4419 Release:8.9.0 Date:12/16/2008 Time:00:22 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Wed Aug 9 23:05:57 2000 : Mon Dec 15 23:49:41 2008 Machine ID : 8317 : 4419 Reticle ID : 45440251DUV : MATCH5X0APAJ Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 70 : 74 Lens ID : 0111654a : Energy [mJ/cm2] : 18.0 : 191.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.66 : Sigma Inner : 0.00 : Sigma Outer : 0.65 : Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 992.5 : 991.0 Wavelength [nm] : 248.305 : 365.000 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYM_4419_8317.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 21.0 Y [mm] : 27.4 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_OV759_28R6_ASM80 ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | 16.3 | -6.4 | | | St. Dev. | 32.5 | 38.2 | | | |Mean| + 3 Sigma | 113.9 | 121.0 | | | Maximum 99.7% | 76.9 | 93.6 | 109.9 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+----------+---------+----------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+==========+=========+==========+===============+===============+ | 1 | 60.3 | 12.5 | 70.7 | 8.640 | -8.640 | | 2 | 58.5 | 14.3 | 46.0 | -4.320 | -4.320 | | 3 | 57.8 | 15.5 | 4.2 | -4.320 | -0.000 | | 4 | 51.2 | 12.7 | 15.8 | -8.640 | -0.000 | | 5 | 39.7 | 20.2 | 36.5 | 8.640 | 8.640 | | 6 | 35.6 | 12.6 | 38.3 | -8.640 | 8.640 | | 7 | 31.5 | 18.0 | 40.8 | -4.320 | 4.320 | | 8 | 26.9 | 13.4 | 26.6 | -0.000 | -8.640 | | 9 | 25.6 | 20.1 | 25.9 | -8.640 | -8.640 | | 10 | 20.8 | 11.5 | 34.2 | -0.000 | -4.320 | +------+----------+---------+----------+---------------+---------------+ +------+----------+---------+----------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DY | Stdev | DX | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+==========+=========+==========+===============+===============+ | 1 | 70.7 | 19.1 | 60.3 | 8.640 | -8.640 | | 2 | 54.3 | 14.8 | 10.3 | -0.000 | 4.320 | | 3 | 50.2 | 19.1 | 12.9 | 4.320 | 4.320 | | 4 | 46.0 | 18.0 | 58.5 | -4.320 | -4.320 | | 5 | 40.8 | 14.9 | 31.5 | -4.320 | 4.320 | | 6 | 38.3 | 14.4 | 35.6 | -8.640 | 8.640 | | 7 | 36.5 | 17.6 | 39.7 | 8.640 | 8.640 | | 8 | 34.2 | 16.6 | 20.8 | -0.000 | -4.320 | | 9 | 33.5 | 17.9 | 15.9 | 8.640 | -0.000 | | 10 | 26.6 | 14.8 | 26.9 | -0.000 | -8.640 | +------+----------+---------+----------+---------------+---------------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | 0.016 | 0.014 | 16.3 | 13.7 | | Translation in Y [um] | -0.006 | 0.015 | -6.4 | 14.7 | | Rotation [urad] | -0.384 | 0.349 | -5.7 | 5.2 | | Magnification [ppm] | 0.189 | 0.365 | 2.8 | 5.4 | | 3rd Order Dist. [nm/cm3] | | | | | | Asymm. Rotation [urad] | | | | | | Asymm. Magnification [ppm] | | | | | +------------------------------+----------+----------+----------+----------+ Interfield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | 0.016 | 0.000 | 16.3 | 0.0 | | Translation in Y [um] | -0.006 | 0.000 | -6.4 | 0.0 | | Wafer Rotation [urad] | -0.118 | 0.000 | -12.0 | 0.0 | | Nonorthogonality [urad] | -0.010 | 0.000 | -1.0 | 0.0 | | Scaling in X [ppm] | -0.252 | 0.000 | -25.6 | 0.0 | | Scaling in Y [ppm] | -0.220 | 0.000 | -22.3 | 0.0 | | Rotation Scaling [urad/cm] | -0.005 | 0.000 | -0.8 | 0.0 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 31.0 | | Residual Y [nm] | 35.7 | +--------------------+---------+ Overlay Error after proposed Corrections are carried out: +------------------+-----------------------------+ | | Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -0.0 | 0.0 | | | St. Dev. | 31.4 | 36.4 | | | |Mean| + 3 Sigma | 94.3 | 109.3 | | | Maximum 99.7% | 61.8 | 74.9 | 91.6 | +------------------+---------+---------+---------+ THE FOLLOWING CORRECTIONS SHOULD BE APPLIED TO THE MACHINE CONSTANTS: +------------------------------------+-------------+-------------+-------------+ | | Reference | Correction | New | +====================================+=============+=============+=============+ | Matching Translation in X [um] | -0.014 | 0.016 | 0.002 | | Matching Translation in Y [um] | 0.002 | -0.006 | -0.005 | | Matching Rotation [urad] | -0.685 | -0.384 | -1.069 | | Matching Magnification [ppm] | -4.584 | 0.189 | -4.395 | | Matching 3rd Order Dist. [nm/cm3] | | | | | Matching Asym. Rotation [urad] | | | | | Matching Asym. Magnification [ppm] | | | | | Reticle Height [um] | | | | | Stone to Lens Tilt Rx [urad] | | | | | Stone to Lens Tilt Ry [urad] | | | | | White Level Sensor Tilt Rx [urad] | | | | | White Level Sensor Tilt Ry [urad] | | | | | Level Sensor Height [um] | | | | | Rotation Scaling [urad/cm] | 0.015 | -0.005 | 0.010 | | Wafer Rotation [urad] | | | | | Nonorthogonality [urad] | 0.022 | -0.010 | 0.012 | | Scaling in X [ppm] | | | | | Scaling in Y [ppm] | -0.254 | 0.032 | -0.222 | +------------------------------------+-------------+-------------+-------------+ update: ------ Save System Optimized State - ...ogy Calibration/Machine Matching/Field Matching Operator:ASM Machine:4419 Release:8.9.0 Date:12/16/2008 Time:00:26 Save System optimized State Matching Set ID Current : ORIGINAL Matching Set corrects for : Intrafield and Asymmetric Interfield offsets Lens matching Translation X [um] Current : -0.014 New : 0.002 Translation Y [um] Current : 0.002 New : -0.005 Rotation [urad] Current : -0.685 New : -1.069 Asym. Rotation [urad] Current : 0.000 New : 0.000 Magnification [ppm] Current : -4.584 New : -4.395 Asym. Magnification [ppm] Current : 0.000 New : 0.000 3rd Order Lens Distortion [nm/cm3] Current : 0.000 New : 0.000 Save System optimized State Grid Matching Non-Orthogonality [urad] Current : 0.022 New : 0.012 Scaling Factor Y [ppm] Current : -0.254 New : -0.222 Rotation Scaling [urad/cm] Current : 0.015 New : 0.010 test de verif: ------------- Data Modelling - Metrology Calibration/Machine Matching/Field Matching Operator:ASM Machine:4419 Release:8.9.0 Date:12/16/2008 Time:01:28 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Wed Aug 9 23:05:57 2000 : Tue Dec 16 00:54:02 2008 Machine ID : 8317 : 4419 Reticle ID : 45440251DUV : MATCH5X0APAJ Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 70 : 74 Lens ID : 0111654a : Energy [mJ/cm2] : 18.0 : 191.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.66 : Sigma Inner : 0.00 : Sigma Outer : 0.65 : Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 992.5 : 990.6 Wavelength [nm] : 248.305 : 365.000 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYM_4419_8317.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 21.0 Y [mm] : 27.4 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_OV759_28R6_ASM80 ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -17.9 | 5.7 | | | St. Dev. | 33.3 | 38.6 | | | |Mean| + 3 Sigma | 117.7 | 121.5 | | | Maximum 99.7% | 88.5 | 82.1 | 92.8 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+----------+---------+----------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+==========+=========+==========+===============+===============+ | 1 | 67.4 | 12.5 | 44.7 | -8.640 | 8.640 | | 2 | 56.7 | 20.8 | 10.4 | -8.640 | -8.640 | | 3 | 53.9 | 17.2 | 19.1 | 8.640 | -0.000 | | 4 | 49.9 | 16.4 | 40.7 | 4.320 | 4.320 | | 5 | 44.1 | 14.5 | 8.8 | 4.320 | -0.000 | | 6 | 31.4 | 15.1 | 11.4 | -0.000 | 8.640 | | 7 | 28.9 | 15.8 | 4.2 | -0.000 | -0.000 | | 8 | 27.9 | 13.6 | 24.3 | 4.320 | -4.320 | | 9 | 27.5 | 15.9 | 61.6 | -4.320 | -4.320 | | 10 | 26.7 | 14.0 | 17.2 | -4.320 | -0.000 | +------+----------+---------+----------+---------------+---------------+ +------+----------+---------+----------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DY | Stdev | DX | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+==========+=========+==========+===============+===============+ | 1 | 61.6 | 19.5 | 27.5 | -4.320 | -4.320 | | 2 | 53.0 | 18.5 | 23.6 | 8.640 | -8.640 | | 3 | 49.8 | 18.2 | 11.4 | -0.000 | -4.320 | | 4 | 44.7 | 15.2 | 67.4 | -8.640 | 8.640 | | 5 | 44.5 | 19.4 | 2.0 | 8.640 | 8.640 | | 6 | 43.9 | 13.7 | 4.2 | -0.000 | -8.640 | | 7 | 42.3 | 17.0 | 25.5 | -0.000 | 4.320 | | 8 | 40.7 | 20.7 | 49.9 | 4.320 | 4.320 | | 9 | 31.5 | 15.5 | 0.3 | -4.320 | 4.320 | | 10 | 24.4 | 17.3 | 21.2 | -8.640 | -0.000 | +------+----------+---------+----------+---------------+---------------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | -0.018 | 0.014 | -17.9 | 14.0 | | Translation in Y [um] | 0.006 | 0.016 | 5.7 | 16.0 | | Rotation [urad] | -0.210 | 0.344 | -3.1 | 5.1 | | Magnification [ppm] | -0.351 | 0.341 | -5.2 | 5.1 | | 3rd Order Dist. [nm/cm3] | | | | | | Asymm. Rotation [urad] | | | | | | Asymm. Magnification [ppm] | | | | | +------------------------------+----------+----------+----------+----------+ Interfield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | -0.018 | 0.000 | -17.9 | 0.0 | | Translation in Y [um] | 0.006 | 0.000 | 5.7 | 0.0 | | Wafer Rotation [urad] | -0.096 | 0.000 | -9.7 | 0.0 | | Nonorthogonality [urad] | -0.004 | 0.000 | -0.4 | 0.0 | | Scaling in X [ppm] | -0.278 | 0.000 | -28.3 | 0.0 | | Scaling in Y [ppm] | -0.270 | 0.000 | -27.4 | 0.0 | | Rotation Scaling [urad/cm] | -0.011 | 0.000 | -1.6 | 0.0 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 31.5 | | Residual Y [nm] | 35.8 | +--------------------+---------+ Overlay Error after proposed Corrections are carried out: +------------------+-----------------------------+ | | Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -0.0 | -0.0 | | | St. Dev. | 31.9 | 36.3 | | | |Mean| + 3 Sigma | 95.6 | 109.0 | | | Maximum 99.7% | 62.4 | 73.9 | 90.0 | +------------------+---------+---------+---------+ THE FOLLOWING CORRECTIONS SHOULD BE APPLIED TO THE MACHINE CONSTANTS: +------------------------------------+-------------+-------------+-------------+ | | Reference | Correction | New | +====================================+=============+=============+=============+ | Matching Translation in X [um] | 0.002 | -0.018 | -0.016 | | Matching Translation in Y [um] | -0.005 | 0.006 | 0.001 | | Matching Rotation [urad] | -1.069 | -0.210 | -1.279 | | Matching Magnification [ppm] | -4.395 | -0.351 | -4.746 | | Matching 3rd Order Dist. [nm/cm3] | | | | | Matching Asym. Rotation [urad] | | | | | Matching Asym. Magnification [ppm] | | | | | Reticle Height [um] | | | | | Stone to Lens Tilt Rx [urad] | | | | | Stone to Lens Tilt Ry [urad] | | | | | White Level Sensor Tilt Rx [urad] | | | | | White Level Sensor Tilt Ry [urad] | | | | | Level Sensor Height [um] | | | | | Rotation Scaling [urad/cm] | 0.010 | -0.011 | -0.001 | | Wafer Rotation [urad] | | | | | Nonorthogonality [urad] | 0.012 | -0.004 | 0.009 | | Scaling in X [ppm] | | | | | Scaling in Y [ppm] | -0.222 | 0.009 | -0.213 | +------------------------------------+-------------+-------------+-------------+ update: ------- Save System Optimized State - ...ogy Calibration/Machine Matching/Field Matching Operator:ASM Machine:4419 Release:8.9.0 Date:12/16/2008 Time:01:31 Save System optimized State Matching Set ID Current : ORIGINAL Matching Set corrects for : Intrafield and Asymmetric Interfield offsets Lens matching Translation X [um] Current : 0.002 New : -0.016 Translation Y [um] Current : -0.005 New : 0.001 Rotation [urad] Current : -1.069 New : -1.279 Asym. Rotation [urad] Current : 0.000 New : 0.000 Magnification [ppm] Current : -4.395 New : -4.746 Asym. Magnification [ppm] Current : 0.000 New : 0.000 3rd Order Lens Distortion [nm/cm3] Current : 0.000 New : 0.000 Save System optimized State Grid Matching Non-Orthogonality [urad] Current : 0.012 New : 0.009 Scaling Factor Y [ppm] Current : -0.222 New : -0.213 Rotation Scaling [urad/cm] Current : 0.010 New : -0.001 test de verif: ------------- Data Modelling - Metrology Calibration/Machine Matching/Field Matching Operator:ASM Machine:4419 Release:8.9.0 Date:12/16/2008 Time:02:17 Machine to Machine Matching Exposure Layer : --- First --- : --- Second --- Date/Time : Wed Aug 9 23:05:57 2000 : Tue Dec 16 01:54:58 2008 Machine ID : 8317 : 4419 Reticle ID : 45440251DUV : MATCH5X0APAJ Reference Grid : : Matching set ID : DEFAULT : ORIGINAL Reticle Alignment : TTL Align : TTL Align Wafer Alignment : TTL Align : TTL Align Lens Type : 70 : 74 Lens ID : 0111654a : Energy [mJ/cm2] : 18.0 : 191.0 Focus Offset [um] : 0.00 : 0.00 Illumination Mode : Default : Conventional Blade ID : : Numerical Aperture : 0.66 : Sigma Inner : 0.00 : Sigma Outer : 0.65 : Temperature [degC] : 22.0 : 22.0 Pressure [mbar] : 992.5 : 990.4 Wavelength [nm] : 248.305 : 365.000 Comments from: 'Exposure First Layer' : 'Exposure Second Layer' : 'Measure Mark Positions' : 'XY-Imaging Modelling' : Test Log Name : XYM_4419_8317.tlg Optimization Method : Least-Squares Number of Wafers : 1 Number of Rejected Wafers : 0 Number of Fields per Wafer : 12 Number of Marks per Field : 17 Alignment Errors in Data : 0 Max Field Size X [mm] : 21.0 Y [mm] : 27.4 Wafer/Field/Mark Selection : *:*:* Align. Errors in Selection : 0 Overlay Mode : Second to First Set Threshold : OFF Reticle data used : Reticle data from testlog Reticle layout used : 4X_OV759_28R6_ASM80 ============================================================================== Overlay Error for this Batch: +------------------+-----------------------------+ | | Filtered Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | 5.6 | 5.0 | | | St. Dev. | 34.6 | 39.4 | | | |Mean| + 3 Sigma | 109.5 | 123.2 | | | Maximum 99.7% | 70.9 | 83.8 | 102.6 | +------------------+---------+---------+---------+ Maximum Overlay Error positions for this Batch: +------+----------+---------+----------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DX | Stdev | DY | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+==========+=========+==========+===============+===============+ | 1 | 53.9 | 12.3 | 53.5 | 8.640 | -8.640 | | 2 | 50.2 | 16.7 | 58.9 | -4.320 | -4.320 | | 3 | 49.9 | 16.1 | 15.3 | -4.320 | -0.000 | | 4 | 48.9 | 12.7 | 43.8 | -8.640 | 8.640 | | 5 | 45.0 | 13.8 | 22.8 | -8.640 | -0.000 | | 6 | 39.2 | 31.6 | 22.0 | -8.640 | -8.640 | | 7 | 28.4 | 17.3 | 18.2 | 8.640 | -0.000 | | 8 | 26.1 | 16.3 | 40.1 | 4.320 | 4.320 | | 9 | 23.2 | 20.0 | 49.5 | 8.640 | 8.640 | | 10 | 22.2 | 14.3 | 41.4 | -0.000 | -8.640 | +------+----------+---------+----------+---------------+---------------+ +------+----------+---------+----------+-------------------------------+ | | | | |Corresponding Position in Field| | | | | +---------------+---------------+ | Nr | Max DY | Stdev | DX | X | Y | | | [nm] | [nm] | [nm] | [mm] | [mm] | +======+==========+=========+==========+===============+===============+ | 1 | 58.9 | 21.5 | 50.2 | -4.320 | -4.320 | | 2 | 53.5 | 21.2 | 53.9 | 8.640 | -8.640 | | 3 | 49.7 | 18.8 | 11.7 | -0.000 | -4.320 | | 4 | 49.5 | 19.6 | 23.2 | 8.640 | 8.640 | | 5 | 43.8 | 17.0 | 48.9 | -8.640 | 8.640 | | 6 | 42.2 | 19.0 | 3.6 | -0.000 | 4.320 | | 7 | 41.4 | 17.5 | 22.2 | -0.000 | -8.640 | | 8 | 40.1 | 22.5 | 26.1 | 4.320 | 4.320 | | 9 | 31.8 | 16.6 | 22.1 | -4.320 | 4.320 | | 10 | 24.3 | 23.1 | 3.0 | 4.320 | -4.320 | +------+----------+---------+----------+---------------+---------------+ Intrafield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | 0.006 | 0.014 | 5.6 | 14.1 | | Translation in Y [um] | 0.005 | 0.018 | 5.0 | 17.6 | | Rotation [urad] | 0.049 | 0.376 | 0.7 | 5.6 | | Magnification [ppm] | 0.009 | 0.530 | 0.1 | 7.9 | | 3rd Order Dist. [nm/cm3] | | | | | | Asymm. Rotation [urad] | | | | | | Asymm. Magnification [ppm] | | | | | +------------------------------+----------+----------+----------+----------+ Interfield Overlay Error Classification: +------------------------------+---------------------+---------------------+ | | Model Parameters |Max. Resulting Errors| | +----------+----------+----------+----------+ | | Mean |Std. Dev. | Mean |Std. Dev. | | | | | [nm] | [nm] | +==============================+==========+==========+==========+==========+ | Translation in X [um] | 0.006 | 0.000 | 5.6 | 0.0 | | Translation in Y [um] | 0.005 | 0.000 | 5.0 | 0.0 | | Wafer Rotation [urad] | -0.095 | 0.000 | -9.7 | 0.0 | | Nonorthogonality [urad] | 0.002 | 0.000 | 0.2 | 0.0 | | Scaling in X [ppm] | -0.255 | 0.000 | -25.9 | 0.0 | | Scaling in Y [ppm] | -0.301 | 0.000 | -30.6 | 0.0 | | Rotation Scaling [urad/cm] | 0.003 | 0.000 | 0.4 | 0.0 | +------------------------------+----------+----------+----------+----------+ Residuals for this batch: +--------------------+---------+ | | Value | +====================+=========+ | Residual X [nm] | 32.5 | | Residual Y [nm] | 36.5 | +--------------------+---------+ Overlay Error after proposed Corrections are carried out: +------------------+-----------------------------+ | | Overlay Error | | +---------+---------+---------+ | | X | Y | Vector | | | [nm] | [nm] | [nm] | +==================+=========+=========+=========+ | Mean | -0.0 | -0.0 | | | St. Dev. | 33.7 | 37.4 | | | |Mean| + 3 Sigma | 101.0 | 112.1 | | | Maximum 99.7% | 67.5 | 83.9 | 90.0 | +------------------+---------+---------+---------+ THE FOLLOWING CORRECTIONS SHOULD BE APPLIED TO THE MACHINE CONSTANTS: +------------------------------------+-------------+-------------+-------------+ | | Reference | Correction | New | +====================================+=============+=============+=============+ | Matching Translation in X [um] | -0.016 | 0.006 | -0.010 | | Matching Translation in Y [um] | 0.001 | 0.005 | 0.006 | | Matching Rotation [urad] | -1.279 | 0.049 | -1.229 | | Matching Magnification [ppm] | -4.746 | 0.009 | -4.737 | | Matching 3rd Order Dist. [nm/cm3] | | | | | Matching Asym. Rotation [urad] | | | | | Matching Asym. Magnification [ppm] | | | | | Reticle Height [um] | | | | | Stone to Lens Tilt Rx [urad] | | | | | Stone to Lens Tilt Ry [urad] | | | | | White Level Sensor Tilt Rx [urad] | | | | | White Level Sensor Tilt Ry [urad] | | | | | Level Sensor Height [um] | | | | | Rotation Scaling [urad/cm] | -0.001 | 0.003 | 0.002 | | Wafer Rotation [urad] | | | | | Nonorthogonality [urad] | 0.009 | 0.002 | 0.011 | | Scaling in X [ppm] | | | | | Scaling in Y [ppm] | -0.213 | -0.047 | -0.260 | +------------------------------------+-------------+-------------+-------------+ -------------------------------------------------------------------------------- CD Matching -------------------------------------------------------------------------------- fait pAr tpm svg -------------------------------------------------------------------------------- Back-up Machine Constants sur hd -------------------------------------------------------------------------------- 12/16/2008 02:19:44 Machine:4419 (Rel:8.9.0.c, MCST [23428], MCMA_step.c, 1516) OK All Machine Constants are backed up to file: MC/4419_ALL_machine.const.2008_12_16.02h19m44.tgz Crated ~1995 vintage.
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